Title :
Nanomechanical mass sensor for monitoring deposition rates through confined apertures
Author :
Arcamone, Julien ; Sansa, Marc ; Verd, Jaume ; Uranga, Arantxa ; Abadal, Gabriel ; Barniol, N. ; Van den Boogaart, Marc A F ; Brugger, Juergen ; Perez-Murano, Francese
Author_Institution :
CNM-IMB, Bellaterra
Abstract :
A nanoelectromechanical mass sensor is used to characterize material deposition rates in stencil lithography. The material flux through micron size apertures is mapped with high spatial (below 1 mum) and deposition rate (below 10 mum/s) resolutions by displacing stencil apertures above the sensor. The sensor is based on a resonating metallic beam with submicron-size width and thickness. The beam is monolithically integrated with a CMOS readout and amplifier circuit to constitute a self-oscillator.
Keywords :
mass measurement; nanolithography; nanosensors; CMOS readout; amplifier circuit; confined apertures; deposition rates; material flux; nanomechanical mass sensor; self-oscillator; stencil lithography; Apertures; Control systems; Lithography; Monitoring; Optical sensors; Resonance; Resonant frequency; Sensor phenomena and characterization; Sensor systems; Spatial resolution; Dynamic (nano)Stencil Lithography; Mass Sensor; Micro / Nano-electromechanical systems (MEMS/NEMS); Nanomechanical sensors / CMOS-MEMS;
Conference_Titel :
Nano/Micro Engineered and Molecular Systems, 2009. NEMS 2009. 4th IEEE International Conference on
Conference_Location :
Shenzhen
Print_ISBN :
978-1-4244-4629-2
Electronic_ISBN :
978-1-4244-4630-8
DOI :
10.1109/NEMS.2009.5068534
