Nanomechanical mass sensor for monitoring deposition rates through confined apertures

Author

Arcamone, Julien ; Sansa, Marc ; Verd, Jaume ; Uranga, Arantxa ; Abadal, Gabriel ; Barniol, N. ; Van den Boogaart, Marc A F ; Brugger, Juergen ; Perez-Murano, Francese

Author_Institution

CNM-IMB, Bellaterra

fYear

2009

fDate

5-8 Jan. 2009

Firstpage

94

Lastpage

97

Abstract

A nanoelectromechanical mass sensor is used to characterize material deposition rates in stencil lithography. The material flux through micron size apertures is mapped with high spatial (below 1 mum) and deposition rate (below 10 mum/s) resolutions by displacing stencil apertures above the sensor. The sensor is based on a resonating metallic beam with submicron-size width and thickness. The beam is monolithically integrated with a CMOS readout and amplifier circuit to constitute a self-oscillator.

Keywords

mass measurement; nanolithography; nanosensors; CMOS readout; amplifier circuit; confined apertures; deposition rates; material flux; nanomechanical mass sensor; self-oscillator; stencil lithography; Apertures; Control systems; Lithography; Monitoring; Optical sensors; Resonance; Resonant frequency; Sensor phenomena and characterization; Sensor systems; Spatial resolution; Dynamic (nano)Stencil Lithography; Mass Sensor; Micro / Nano-electromechanical systems (MEMS/NEMS); Nanomechanical sensors / CMOS-MEMS;

fLanguage

English

Publisher

ieee

Conference_Titel

Nano/Micro Engineered and Molecular Systems, 2009. NEMS 2009. 4th IEEE International Conference on

Conference_Location

Shenzhen

Print_ISBN

978-1-4244-4629-2

Electronic_ISBN

978-1-4244-4630-8

Type

conf

DOI

10.1109/NEMS.2009.5068534

Filename

5068534