Title :
Novel methods for the reliability testing of ferroelectric DRAM storage capacitors
Author :
Sudhama, C. ; Khamankaar, R. ; Kim, Jung-Ho ; Jiang, Bo ; Lee, Jong Chul
Author_Institution :
Motorola Inc., Mesa, AZ, USA
Abstract :
A new technique has been developed for the characterization of dielectric voltage- and charge-decay times (T/sub V/ and T/sub Q/) in sol-gel derived ferroelectric films under open-circuit conditions. Voltage decay potentially poses a limitation on the maximum allowable refresh-time in the DRAM capacitor. This direct measurement of T/sub V/ is preferred to its conventional estimation based on the current-voltage relationship, because of the implicit inclusion of nonlinearities and stress-induced leakage-reduction effects. Undoped and lanthanum-doped lead-zirconate-titanate (PZT) films have also been characterized for frequency-dispersion in large-signal polarization, bit "0" relaxation and a new bit "1" relaxation mechanism using techniques developed recently. It is proposed that any evaluation of high-permittivity dielectrics for DRAM applications must include these measurements.<>
Keywords :
DRAM chips; circuit reliability; ferroelectric storage; ferroelectric thin films; integrated circuit testing; lanthanum compounds; lead compounds; metal-insulator-semiconductor devices; piezoelectric materials; time measurement; PLZT; PZT; PbLaZrO3TiO3; PbZrO3TiO3; charge-decay time; direct measurement; ferroelectric DRAM storage capacitors; ferroelectric films; frequency-dispersion; high-permittivity dielectrics; large-signal polarization; open-circuit conditions; refresh-time; relaxation mechanism; reliability testing; sol-gel derived films; stress-induced leakage-reduction effects; voltage-decay time; Capacitors; Current measurement; Dielectric measurements; Ferroelectric films; Ferroelectric materials; Frequency; Random access memory; Stress measurement; Testing; Voltage;
Conference_Titel :
Reliability Physics Symposium, 1994. 32nd Annual Proceedings., IEEE International
Conference_Location :
San Jose, CA, USA
Print_ISBN :
0-7803-1357-7
DOI :
10.1109/RELPHY.1994.307831