• DocumentCode
    1956711
  • Title

    SOI thickness uniformity improvement using corrective etching for silicon nano-photonic device

  • Author

    Selvaraja, Shankar Kumar ; Rosseel, Erik ; Fernandez, Luis ; Tabat, Martin ; Bogaerts, Wim ; Hautala, John ; Absil, Philippe

  • Author_Institution
    Photonics Res. Group, Ghent Univ. - imec, Ghent, Belgium
  • fYear
    2011
  • fDate
    14-16 Sept. 2011
  • Firstpage
    71
  • Lastpage
    73
  • Abstract
    We present our recent results on Si thickness uniformity improvement in a SOI wafer. We improved the thickness uniformity by 50%. The effect of the correction process on the propagation loss and device uniformity is also presented.
  • Keywords
    etching; integrated optics; light propagation; nanophotonics; optical losses; silicon-on-insulator; SOI thickness uniformity improvement; Si; corrective etching; propagation loss; silicon nanophotonic device; Adaptive optics; Optical device fabrication; Optical filters; Optical waveguides; Propagation losses; Silicon; Surface treatment;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Group IV Photonics (GFP), 2011 8th IEEE International Conference on
  • Conference_Location
    London
  • ISSN
    1949-2081
  • Print_ISBN
    978-1-4244-8338-9
  • Type

    conf

  • DOI
    10.1109/GROUP4.2011.6053719
  • Filename
    6053719
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1956711