Title :
SOI thickness uniformity improvement using corrective etching for silicon nano-photonic device
Author :
Selvaraja, Shankar Kumar ; Rosseel, Erik ; Fernandez, Luis ; Tabat, Martin ; Bogaerts, Wim ; Hautala, John ; Absil, Philippe
Author_Institution :
Photonics Res. Group, Ghent Univ. - imec, Ghent, Belgium
Abstract :
We present our recent results on Si thickness uniformity improvement in a SOI wafer. We improved the thickness uniformity by 50%. The effect of the correction process on the propagation loss and device uniformity is also presented.
Keywords :
etching; integrated optics; light propagation; nanophotonics; optical losses; silicon-on-insulator; SOI thickness uniformity improvement; Si; corrective etching; propagation loss; silicon nanophotonic device; Adaptive optics; Optical device fabrication; Optical filters; Optical waveguides; Propagation losses; Silicon; Surface treatment;
Conference_Titel :
Group IV Photonics (GFP), 2011 8th IEEE International Conference on
Conference_Location :
London
Print_ISBN :
978-1-4244-8338-9
DOI :
10.1109/GROUP4.2011.6053719
