Ion beam generator for technological applications

Author

Bystritskii, V.M. ; Grigoriev, S.V. ; Lisitsyn, I.V. ; Mytnikov, A.V. ; Volkov, S.N.

Author_Institution

Inst. of Electrophys., Ekaterinburg, Russia

fYear

1993

fDate

7-9 June 1993

Firstpage

209

Abstract

Summary form only given. The commissioning of the medium-power-level light ion beam accelerator GIMN (700 kV, 5 Ohm, 80 ns pulse) with an extractor-type magnetically insulated ion diode is considered. The anode source of the mixed ion beam (H/sup +/, C/sup +/) is of passive polyethylene loaded surface breakdown type with a curvature radius of 13 cm. The control of the ion beam density at the target surface is provided according to the variable distance from the anode (15-50 cm) and AC gap (8-12 mm). The beam parameters at the anode are ion current density of 300 A/cm/sup 2/ total current amplitude of 50 kA, maximum density of 7-8 kA/cm/sup 2/.

Keywords

ion beams; 15 to 50 cm; 5 ohm; 700 kV; 8 to 12 mm; 80 ns; C/sup +/; GIMN; H/sup +/; anode; anode source; beam parameters; extractor-type magnetically insulated ion diode; ion beam density; ion beam generators; ion current density; light ion beam accelerator; maximum density; mixed ion beam; polyethylene loaded surface breakdown; target surface; technological applications; total current amplitude; Accelerator magnets; Anodes; Current density; Diodes; Electric breakdown; Insulation; Ion accelerators; Ion beams; Magnetic variables control; Polyethylene;

fLanguage

English

Publisher

ieee

Conference_Titel

Plasma Science, 1993. IEEE Conference Record - Abstracts., 1993 IEEE International Conference on

Conference_Location

Vancouver, BC, Canada

ISSN

0730-9244

Print_ISBN

0-7803-1360-7

Type

conf

DOI

10.1109/PLASMA.1993.593569

Filename

593569