Title :
Hydrogen plasma treatment for Si waveguide smoothing
Author :
Cai, Jingnan ; Wang, Yu ; Ishikawa, Yasuhiko ; Yamashita, Yoshifumi ; Kamiura, Yoichi ; Wada, Kazumi
Author_Institution :
Dept. of Mater. Eng., Univ. of Tokyo, Tokyo, Japan
Abstract :
We demonstrated that remote hydrogen plasma treatment on silicon ring resonators can smooth the Si waveguides at lower than 100°C. This also provides a promising way to trim resonators for a designed add/drop wavelength.
Keywords :
elemental semiconductors; hydrogen; optical resonators; optical waveguides; plasma materials processing; silicon; Si; Si waveguide smoothing; add/drop wavelength; remote hydrogen plasma treatment; silicon ring resonators; trim resonators; Educational institutions; Optical ring resonators; Optical waveguides; Plasmas; Refractive index; Scanning electron microscopy; Silicon;
Conference_Titel :
Group IV Photonics (GFP), 2011 8th IEEE International Conference on
Conference_Location :
London
Print_ISBN :
978-1-4244-8338-9
DOI :
10.1109/GROUP4.2011.6053727
