DocumentCode :
1957972
Title :
Controlling strain in Ge on Si for EA modulators
Author :
Kuroyanagi, Ryo ; Ishikawa, Yasuhiko ; Tsuchizawa, Tai ; Itabashi, Seiichi ; Wada, Kazumi
Author_Institution :
Dept. of Marerials Eng., Univ. of Tokyo, Tokyo, Japan
fYear :
2011
fDate :
14-16 Sept. 2011
Firstpage :
211
Lastpage :
213
Abstract :
The concept of how to control operation wavelength of Ge electroabsorption modulators with external stress is shown. Enough stress to shift absorption edge of Ge is applied to Ge on Si in our experiments.
Keywords :
electro-optical modulation; electroabsorption; elemental semiconductors; germanium; silicon; strain control; EA modulator; Ge-Si; electroabsorption modulator; operation wavelength; strain control; Absorption; Modulation; Silicon; Silicon compounds; Strain; Stress; Stress measurement;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Group IV Photonics (GFP), 2011 8th IEEE International Conference on
Conference_Location :
London
ISSN :
1949-2081
Print_ISBN :
978-1-4244-8338-9
Type :
conf
DOI :
10.1109/GROUP4.2011.6053766
Filename :
6053766
Link To Document :
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