DocumentCode :
1958767
Title :
Barrier Lowering and Widening of Schottky Barrier MOSFETs by Self-Aligned Multiple Workfunction Gate
Author :
Yeh, Sheng-Pin ; Shih, Chun-Hsing
Author_Institution :
Nat. Tsing Hua Univ., Hsinchu
fYear :
2007
fDate :
18-20 June 2007
Firstpage :
119
Lastpage :
120
Abstract :
We propose a multiple workfunction gate (MWG) structure for SBMOS. We give the schematic view of MWG Schottky barrier MOSFETs (MWG SBMOS), where High (H) and Low (L) indicate different workfunction values are utilized at center and side gate regions, respectively. The MWG structure can be easily realized by a tilt angle implantation with a fully CMOS process.
Keywords :
CMOS integrated circuits; MOSFET; Schottky barriers; work function; CMOS process; Schottky barrier MOSFET; barrier lowering; barrier widening; self aligned multiple workfunction gate; workfunction values; CMOS process; CMOS technology; Contact resistance; Degradation; Electric resistance; Fabrication; Insulation; MOSFETs; Nanoscale devices; Schottky barriers;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Device Research Conference, 2007 65th Annual
Conference_Location :
Notre Dame, IN
ISSN :
1548-3770
Print_ISBN :
978-1-4244-1101-6
Electronic_ISBN :
1548-3770
Type :
conf
DOI :
10.1109/DRC.2007.4373678
Filename :
4373678
Link To Document :
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