DocumentCode
1958913
Title
Assessment of solidly mounted resonators with wide-band asymmetric acoustic reflectors
Author
Olivares, J. ; Wegmann, E. ; Clement, M. ; Capilla, J. ; Iborra, E. ; Sangrador, J.
Author_Institution
Grupo de Microsistemas y Mater. Electronicos, Univ. Politec. de Madrid, Madrid, Spain
fYear
2010
fDate
11-14 Oct. 2010
Firstpage
1677
Lastpage
1680
Abstract
We investigate the influence of the structure of acoustic reflectors on the quality factors of solidly mounted bulk acoustic wave resonators made of aluminum nitride. We compare the quality factors of resonators built on conventional λ/4 Bragg reflectors with those of resonators fabricated on asymmetric acoustic reflectors composed of layers of thicknesses different from λ/4. The two kinds of reflectors are made of porous silicon dioxide and iridium as low and high acoustic impedance materials, respectively. We assess the effective electromechanical coupling factor and the quality factor of various resonators tuned at different frequencies within the reflector band. The effective electromechanical coupling factor is roughly constant at around 6.3% for all the devices. For the symmetric reflectors the quality factor at the antiresonant frequency reaches a minimum at the centre of the band, whereas it remains roughly constant in the whole band for the asymmetric reflectors. This is attributed to the greater reflection of shear waves in the center of the band provided by the asymmetric reflectors.
Keywords
Q-factor; acoustic impedance; acoustic resonators; acoustic wave reflection; aluminium compounds; bulk acoustic wave devices; AlN; Bragg reflectors; antiresonant frequency; electromechanical coupling factor; high acoustic impedance materials; porous silicon dioxide; quality factors; solid mounted resonators; wide-band asymmetric acoustic reflectors; Acoustic waves; Electrodes; Q factor; Reflection; Resonant frequency; Substrates; Acoustic reflector; Aluminum nitride; BAW filters; Bragg mirror; Iridium; Porous silicon oxide;
fLanguage
English
Publisher
ieee
Conference_Titel
Ultrasonics Symposium (IUS), 2010 IEEE
Conference_Location
San Diego, CA
ISSN
1948-5719
Print_ISBN
978-1-4577-0382-9
Type
conf
DOI
10.1109/ULTSYM.2010.5935777
Filename
5935777
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