DocumentCode
1959221
Title
Control of Threshold Voltage in 80 nm Gate Length InAs Vertical Nanowire WIGFETs
Author
Löwgren, Truls ; Ohlsson, Jonas ; Samuelson, Lars ; Wernersson, Lars-Erik
Author_Institution
QuMat Technol. AB, Lund
fYear
2007
fDate
18-20 June 2007
Firstpage
165
Lastpage
166
Abstract
Numerous investigations have studied the performance of lateral transistors based on single nanowires, there are only a few studies of the fabrication and performance of vertical transistors with wrap-gates, so called WIGFETs. Based on our previous study of 800 nm gate length transistors, we have now scaled the technology to sub 100 nm gate length and study the lateral scaling of the nanowires in the transistor structure. It is demonstrated that the scaling provides a mean to adjust the threshold voltage of the transistor.
Keywords
Fermi level; III-V semiconductors; carrier mobility; chemical beam epitaxial growth; contact resistance; electric potential; field effect transistors; indium compounds; nanoelectronics; nanowires; ohmic contacts; Fermi-level pinning; InAs; chemical beam epitaxy; lateral scaling factor; ohmic contact resistance; size 80 nm; threshold voltage control; transport properties; vertical nanowire WIGFET; vertical wrap-gate transistors; Fabrication; Geometry; Gold; Immune system; Nanoscale devices; Optical films; Physics; Solid state circuits; Threshold voltage; Voltage control;
fLanguage
English
Publisher
ieee
Conference_Titel
Device Research Conference, 2007 65th Annual
Conference_Location
Notre Dame, IN
ISSN
1548-3770
Print_ISBN
978-1-4244-1101-6
Electronic_ISBN
1548-3770
Type
conf
DOI
10.1109/DRC.2007.4373700
Filename
4373700
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