DocumentCode :
1959221
Title :
Control of Threshold Voltage in 80 nm Gate Length InAs Vertical Nanowire WIGFETs
Author :
Löwgren, Truls ; Ohlsson, Jonas ; Samuelson, Lars ; Wernersson, Lars-Erik
Author_Institution :
QuMat Technol. AB, Lund
fYear :
2007
fDate :
18-20 June 2007
Firstpage :
165
Lastpage :
166
Abstract :
Numerous investigations have studied the performance of lateral transistors based on single nanowires, there are only a few studies of the fabrication and performance of vertical transistors with wrap-gates, so called WIGFETs. Based on our previous study of 800 nm gate length transistors, we have now scaled the technology to sub 100 nm gate length and study the lateral scaling of the nanowires in the transistor structure. It is demonstrated that the scaling provides a mean to adjust the threshold voltage of the transistor.
Keywords :
Fermi level; III-V semiconductors; carrier mobility; chemical beam epitaxial growth; contact resistance; electric potential; field effect transistors; indium compounds; nanoelectronics; nanowires; ohmic contacts; Fermi-level pinning; InAs; chemical beam epitaxy; lateral scaling factor; ohmic contact resistance; size 80 nm; threshold voltage control; transport properties; vertical nanowire WIGFET; vertical wrap-gate transistors; Fabrication; Geometry; Gold; Immune system; Nanoscale devices; Optical films; Physics; Solid state circuits; Threshold voltage; Voltage control;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Device Research Conference, 2007 65th Annual
Conference_Location :
Notre Dame, IN
ISSN :
1548-3770
Print_ISBN :
978-1-4244-1101-6
Electronic_ISBN :
1548-3770
Type :
conf
DOI :
10.1109/DRC.2007.4373700
Filename :
4373700
Link To Document :
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