• DocumentCode
    1959221
  • Title

    Control of Threshold Voltage in 80 nm Gate Length InAs Vertical Nanowire WIGFETs

  • Author

    Löwgren, Truls ; Ohlsson, Jonas ; Samuelson, Lars ; Wernersson, Lars-Erik

  • Author_Institution
    QuMat Technol. AB, Lund
  • fYear
    2007
  • fDate
    18-20 June 2007
  • Firstpage
    165
  • Lastpage
    166
  • Abstract
    Numerous investigations have studied the performance of lateral transistors based on single nanowires, there are only a few studies of the fabrication and performance of vertical transistors with wrap-gates, so called WIGFETs. Based on our previous study of 800 nm gate length transistors, we have now scaled the technology to sub 100 nm gate length and study the lateral scaling of the nanowires in the transistor structure. It is demonstrated that the scaling provides a mean to adjust the threshold voltage of the transistor.
  • Keywords
    Fermi level; III-V semiconductors; carrier mobility; chemical beam epitaxial growth; contact resistance; electric potential; field effect transistors; indium compounds; nanoelectronics; nanowires; ohmic contacts; Fermi-level pinning; InAs; chemical beam epitaxy; lateral scaling factor; ohmic contact resistance; size 80 nm; threshold voltage control; transport properties; vertical nanowire WIGFET; vertical wrap-gate transistors; Fabrication; Geometry; Gold; Immune system; Nanoscale devices; Optical films; Physics; Solid state circuits; Threshold voltage; Voltage control;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Device Research Conference, 2007 65th Annual
  • Conference_Location
    Notre Dame, IN
  • ISSN
    1548-3770
  • Print_ISBN
    978-1-4244-1101-6
  • Electronic_ISBN
    1548-3770
  • Type

    conf

  • DOI
    10.1109/DRC.2007.4373700
  • Filename
    4373700