DocumentCode :
1959633
Title :
Plasma lithography for control of cell morphology and proliferation
Author :
Junkin, Michael ; Zhang, Donna D. ; Pak Kin Wong
Author_Institution :
Aerosp. & Mech. Eng. Dept., Univ. of Arizona, Tucson, AZ
fYear :
2009
fDate :
5-8 Jan. 2009
Firstpage :
822
Lastpage :
826
Abstract :
We have utilized a plasma based patterning technique, that we have developed, to study the effects of micrometer and submicrometer scale surface functionalization on cell proliferation and morphology. We have applied this method to cellular patterning and examined the response of mammalian cells to patterns of hydrophobic and hydrophilic areas created directly on polystyrene substrates. We have observed that the residual plasma pattern can serve as a template for cell attachment and growth on patterns at line widths ~22 mum and larger. At smaller sizes, cells do not align themselves with the pattern, but their growth is affected and is significantly less than on homogeneous hydrophilic polystyrene surfaces. This type of patterning could have several uses including tissue engineering, medical implants, or providing a means for studying the fundamental behavior of cell to surface and other interactions.
Keywords :
cellular biophysics; hydrophilicity; hydrophobicity; lithography; plasma applications; prosthetics; tissue engineering; cell attachment; cell morphology; cell proliferation; cellular patterning; hydrophilic areas; hydrophobic areas; mammalian cells; medical implants; patterning; plasma lithography; polystyrene substrates; residual plasma pattern; surface functionalization; tissue engineering; Biological materials; Chemicals; Implants; Lithography; Plasma applications; Plasma chemistry; Surface morphology; Surface topography; Tissue engineering; USA Councils; Cellular patterning; Plasma lithography; Surface patterning; Tissue engineering;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Nano/Micro Engineered and Molecular Systems, 2009. NEMS 2009. 4th IEEE International Conference on
Conference_Location :
Shenzhen
Print_ISBN :
978-1-4244-4629-2
Electronic_ISBN :
978-1-4244-4630-8
Type :
conf
DOI :
10.1109/NEMS.2009.5068703
Filename :
5068703
Link To Document :
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