DocumentCode :
1960188
Title :
The study of low frequency noise of single-walled carbon nanotube transistors
Author :
Kim, Sunkook ; Chang, David ; Xuan, Yi ; Ye, Peide ; Mohammadi, Saeed
Author_Institution :
Purdue Univ., West Lafayette
fYear :
2007
fDate :
18-20 June 2007
Firstpage :
263
Lastpage :
264
Abstract :
In this paper, we report a top gate SWNT-FET with reduced hysteresis in the IV characteristics and extremely low 1/f noise. We have also investigated the source of 1/f noise in these devices and attributed the low noise property to low trap charges near the carbon nanotube substrate interface. The SWNT-FET devices reported here and shown schematically in Fig. 1(a), are fabricated on high resistivity Si substrate (rhoap10 KOmega) with a 500 nm thermal SiO2. Catalyst patterns are defined by UV photolithography with a 10 mum spacing and subsequent iron deposition and lift-off. Single-walled carbon nanotubes (SWNTs) are then synthesized by chemical vapor deposition (CVD) of methane on the substrate using iron catalyst.
Keywords :
1/f noise; carbon nanotubes; catalysts; chemical vapour deposition; field effect transistors; photolithography; substrates; 1/f noise; CVD; SWNT-FET devices; SiO2; UV photolithography; carbon nanotube substrate interface; chemical vapor deposition; field effect transistor; high resistivity Si substrate; iron catalyst; single-walled carbon nanotube transistor; size 10 mum; size 500 nm; Carbon nanotubes; Hafnium oxide; Hysteresis; Lithography; Low-frequency noise; Nanoscale devices; Noise figure; Noise measurement; Substrates; Working environment noise;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Device Research Conference, 2007 65th Annual
Conference_Location :
Notre Dame, IN
ISSN :
1548-3770
Print_ISBN :
978-1-4244-1101-6
Electronic_ISBN :
1548-3770
Type :
conf
DOI :
10.1109/DRC.2007.4373746
Filename :
4373746
Link To Document :
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