Title :
Low pressure RF discharges for lighting
Author_Institution :
Osram Sylvania Inc., Danvers, MA, USA
Abstract :
Summary form only given. Features of low-pressure RF discharges which make them so attractive for fluorescent lighting yet limit their practical embodiment have been examined. Different kinds of low-pressure RF discharges suitable for lighting application, their governing mechanisms and properties, and scaling laws for basic discharge and plasma parameters have been considered. The issues of RF discharge ballasting, RF power loss in the matching circuits, and loss due to ion acceleration typically at the plasma boundaries of capacitively coupled RF discharges have been examined as well as issues of RF interference and the means for their suppression.
Keywords :
high-frequency discharges; RF discharge ballasting; RF interference; RF power loss; capacitively coupled RF discharges; fluorescent lighting; ion acceleration; lighting; low-pressure RF discharges; matching circuits; plasma boundaries; plasma parameters; scaling laws; Acceleration; Circuits; Electronic ballasts; Fluorescence; Fluorescent lamps; Mechanical factors; Plasma accelerators; Plasma applications; Plasma properties; Radio frequency;
Conference_Titel :
Plasma Science, 1993. IEEE Conference Record - Abstracts., 1993 IEEE International Conference on
Conference_Location :
Vancouver, BC, Canada
Print_ISBN :
0-7803-1360-7
DOI :
10.1109/PLASMA.1993.593589