Title :
Atom lithography using standing-wave quenching
Author :
Johnson, K.S. ; Thywissen, J.H. ; Dekker, N.H. ; Chu, A.P. ; Younkin, R. ; Berggren, Karl K. ; Prentiss
Author_Institution :
Dept. of Phys., Harvard Univ., Cambridge, MA, USA
Abstract :
Summary form only given.We used spatially dependent optical pumping in a standing wave to create nanostructures using metastable argon and resist-based atom lithography. Although the localization is caused by spontaneous emission, the matter wave diffraction and the mechanical effects of the light affect the resulting atomic localization. We investigate the role of the spontaneous emission.
Keywords :
atomic beams; lithography; particle optics; radiation pressure; radiation quenching; atom lithography; atomic localization; matter wave diffraction; mechanical effects; metastable argon; nanostructures; resist-based atom lithography; spatially dependent optical pumping; spontaneous emission; standing wave; standing-wave quenching; Argon; Atom lasers; Atom optics; Atomic beams; Atomic measurements; Laser excitation; Lithography; Metastasis; Optical pumping; Stationary state;
Conference_Titel :
Quantum Electronics Conference, 1998. IQEC 98. Technical Digest. Summaries of papers presented at the International
Conference_Location :
San Francisco, CA, USA
Print_ISBN :
1-55752-541-2
DOI :
10.1109/IQEC.1998.680342
