DocumentCode
1961578
Title
Atom lithography using standing-wave quenching
Author
Johnson, K.S. ; Thywissen, J.H. ; Dekker, N.H. ; Chu, A.P. ; Younkin, R. ; Berggren, Karl K. ; Prentiss
Author_Institution
Dept. of Phys., Harvard Univ., Cambridge, MA, USA
fYear
1998
fDate
8-8 May 1998
Firstpage
166
Lastpage
167
Abstract
Summary form only given.We used spatially dependent optical pumping in a standing wave to create nanostructures using metastable argon and resist-based atom lithography. Although the localization is caused by spontaneous emission, the matter wave diffraction and the mechanical effects of the light affect the resulting atomic localization. We investigate the role of the spontaneous emission.
Keywords
atomic beams; lithography; particle optics; radiation pressure; radiation quenching; atom lithography; atomic localization; matter wave diffraction; mechanical effects; metastable argon; nanostructures; resist-based atom lithography; spatially dependent optical pumping; spontaneous emission; standing wave; standing-wave quenching; Argon; Atom lasers; Atom optics; Atomic beams; Atomic measurements; Laser excitation; Lithography; Metastasis; Optical pumping; Stationary state;
fLanguage
English
Publisher
ieee
Conference_Titel
Quantum Electronics Conference, 1998. IQEC 98. Technical Digest. Summaries of papers presented at the International
Conference_Location
San Francisco, CA, USA
Print_ISBN
1-55752-541-2
Type
conf
DOI
10.1109/IQEC.1998.680342
Filename
680342
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