Optically Flat Micromirror Using Stretched Membrane with Crystallization-Induced Stress

Author

Sasaki, Minoru ; Sasaki, Takashi ; Hane, Kazuhiro ; Miura, Hideo

Author_Institution

Toyota Technol. Inst., Nagoya

fYear

2007

fDate

Aug. 12 2007-July 16 2007

Firstpage

27

Lastpage

28

Abstract

The flat and light-weighted micromirror is realized using the tense poly-Si film across a rigid c-Si drum. The tensile stress of ~600 MPa is obtained using the crystallization of a-Si film. Compared to the research carried out by Nee et al., the initial film has the purer amorphous phase and generates larger stress. The mirror satisfies the better optical flatness <lambda/10 for the visible light. The peak-to-valley distance of the micromirror is ~20 nm. The membrane profile is found to depend on the process sequence relating to the timing of the annealing. The mirror shape is stable against the high temperature.

Keywords

amorphous semiconductors; annealing; crystallisation; elemental semiconductors; membranes; micromirrors; optical fabrication; piezo-optical effects; semiconductor thin films; silicon; Si - Element; amorphous phase; annealing; crystallization; crystallization-induced stress; flat micromirror; light-weighted micromirror; membrane profile; mirror shape stability; optical flatness; optically flat micromirror; poly-Si film; rigid c-Si drum; stretched membrane; tensile stress; Amorphous materials; Annealing; Biomembranes; Crystallization; Micromirrors; Mirrors; Optical films; Shape; Tensile stress; Timing; amorphous; crystallization; micromirror; optical flatness; tensile stress;

fLanguage

English

Publisher

ieee

Conference_Titel

Optical MEMS and Nanophotonics, 2007 IEEE/LEOS International Conference on

Conference_Location

Hualien

Print_ISBN

978-1-4244-0641-8

Type

conf

DOI

10.1109/OMEMS.2007.4373823

Filename

4373823