DocumentCode
1961810
Title
Nanometer definition of atomic beams with masks of light
Author
Abfalterer, R. ; Bernet, S. ; Keller, C. ; Oberthaler, M.K. ; Schmiedmayer, J. ; Zeilinger, A.
Author_Institution
Inst. fur Experimentalphys., Innsbruck Univ., Austria
fYear
1998
fDate
8-8 May 1998
Firstpage
167
Lastpage
168
Abstract
Summary form only given.Efficient methods to prepare and measure atomic distributions with nanometer resolution are of particular interest in atom optics and for possible applications in science and technology. A versatile and particularly useful tool is absorptive masks, which can be used both to write and to probe fine structures. We combine the advantages of absorptive masks with the flexibility of light structures. We report the realization of well-defined absorptive masks at nanometer resolution for neutral atoms, which are entirely made of light.
Keywords
argon; atomic beams; masks; nanotechnology; particle optics; 801 nm; Ar; Ar atoms; absorptive masks; argon atoms; atom optics; atomic beams; atomic distributions; fine structures; light structures; masks; nanometer definition; nanometer resolution; neutral atoms; science; technology; Absorption; Argon; Atom optics; Atomic beams; Atomic measurements; Gratings; Metastasis; Optical scattering; Resonance; Stationary state;
fLanguage
English
Publisher
ieee
Conference_Titel
Quantum Electronics Conference, 1998. IQEC 98. Technical Digest. Summaries of papers presented at the International
Conference_Location
San Francisco, CA, USA
Print_ISBN
1-55752-541-2
Type
conf
DOI
10.1109/IQEC.1998.680343
Filename
680343
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