• DocumentCode
    1961810
  • Title

    Nanometer definition of atomic beams with masks of light

  • Author

    Abfalterer, R. ; Bernet, S. ; Keller, C. ; Oberthaler, M.K. ; Schmiedmayer, J. ; Zeilinger, A.

  • Author_Institution
    Inst. fur Experimentalphys., Innsbruck Univ., Austria
  • fYear
    1998
  • fDate
    8-8 May 1998
  • Firstpage
    167
  • Lastpage
    168
  • Abstract
    Summary form only given.Efficient methods to prepare and measure atomic distributions with nanometer resolution are of particular interest in atom optics and for possible applications in science and technology. A versatile and particularly useful tool is absorptive masks, which can be used both to write and to probe fine structures. We combine the advantages of absorptive masks with the flexibility of light structures. We report the realization of well-defined absorptive masks at nanometer resolution for neutral atoms, which are entirely made of light.
  • Keywords
    argon; atomic beams; masks; nanotechnology; particle optics; 801 nm; Ar; Ar atoms; absorptive masks; argon atoms; atom optics; atomic beams; atomic distributions; fine structures; light structures; masks; nanometer definition; nanometer resolution; neutral atoms; science; technology; Absorption; Argon; Atom optics; Atomic beams; Atomic measurements; Gratings; Metastasis; Optical scattering; Resonance; Stationary state;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Quantum Electronics Conference, 1998. IQEC 98. Technical Digest. Summaries of papers presented at the International
  • Conference_Location
    San Francisco, CA, USA
  • Print_ISBN
    1-55752-541-2
  • Type

    conf

  • DOI
    10.1109/IQEC.1998.680343
  • Filename
    680343