DocumentCode
1962002
Title
Semiconductor Process and Device Modeling: a graduate course/undergraduate elective in microelectronic engineering at RIT
Author
Hirschman, Karl D. ; Hebding, Jeremiah ; Saxer, Robert ; Tabakman, Keith
Author_Institution
Dept. of Microelectron. Eng., Rochester Inst. of Technol., NY, USA
fYear
2003
fDate
30 June-2 July 2003
Firstpage
138
Lastpage
146
Abstract
Semiconductor Process and Device Modeling is a senior/graduate level course on the application of simulation tools for design and verification of microelectronic processes and operation of semiconductor devices. The goal of the course is to provide a more in-depth understanding of complex processes and device physics through the use of simulation tools. Silvaco-SUPREM (Athena/Atlas) is the primary process and device simulation tool used throughout the course. The course explores the various models that are used for front-end silicon processes, emphasizing the importance of complex interactions and 2-D effects as devices are scaled deep-submicron. Electrical device simulation and parameter extraction provides a study on how changes in the device structure can influence device operation. The investigation continues to the circuit level through modifications of SPICE model parameters and analog circuit simulation.
Keywords
MOSFET; SPICE; analogue circuits; diffusion; electronic engineering education; elemental semiconductors; ion implantation; oxidation; semiconductor device models; semiconductor process modelling; silicon; tolerance analysis; 2D effects; RIT; SPICE model parameters; Si; Silvaco-SUPREM; analog circuit simulation; complex interactions; complex processes; device simulation tool; device structure; electrical device simulation; front-end silicon processes; graduate course/undergraduate elective; microelectronic engineering; microelectronic processes; parameter extraction; scaled deep-submicron devices; semiconductor device modelling; semiconductor process modelling; Circuit simulation; Design engineering; Laboratories; Microelectronics; Numerical models; Numerical simulation; Oxidation; SPICE; Semiconductor process modeling; Silicon;
fLanguage
English
Publisher
ieee
Conference_Titel
University/Government/Industry Microelectronics Symposium, 2003. Proceedings of the 15th Biennial
ISSN
0749-6877
Print_ISBN
0-7803-7972-1
Type
conf
DOI
10.1109/UGIM.2003.1225714
Filename
1225714
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