Title :
Semiconductor Process and Device Modeling: a graduate course/undergraduate elective in microelectronic engineering at RIT
Author :
Hirschman, Karl D. ; Hebding, Jeremiah ; Saxer, Robert ; Tabakman, Keith
Author_Institution :
Dept. of Microelectron. Eng., Rochester Inst. of Technol., NY, USA
fDate :
30 June-2 July 2003
Abstract :
Semiconductor Process and Device Modeling is a senior/graduate level course on the application of simulation tools for design and verification of microelectronic processes and operation of semiconductor devices. The goal of the course is to provide a more in-depth understanding of complex processes and device physics through the use of simulation tools. Silvaco-SUPREM (Athena/Atlas) is the primary process and device simulation tool used throughout the course. The course explores the various models that are used for front-end silicon processes, emphasizing the importance of complex interactions and 2-D effects as devices are scaled deep-submicron. Electrical device simulation and parameter extraction provides a study on how changes in the device structure can influence device operation. The investigation continues to the circuit level through modifications of SPICE model parameters and analog circuit simulation.
Keywords :
MOSFET; SPICE; analogue circuits; diffusion; electronic engineering education; elemental semiconductors; ion implantation; oxidation; semiconductor device models; semiconductor process modelling; silicon; tolerance analysis; 2D effects; RIT; SPICE model parameters; Si; Silvaco-SUPREM; analog circuit simulation; complex interactions; complex processes; device simulation tool; device structure; electrical device simulation; front-end silicon processes; graduate course/undergraduate elective; microelectronic engineering; microelectronic processes; parameter extraction; scaled deep-submicron devices; semiconductor device modelling; semiconductor process modelling; Circuit simulation; Design engineering; Laboratories; Microelectronics; Numerical models; Numerical simulation; Oxidation; SPICE; Semiconductor process modeling; Silicon;
Conference_Titel :
University/Government/Industry Microelectronics Symposium, 2003. Proceedings of the 15th Biennial
Print_ISBN :
0-7803-7972-1
DOI :
10.1109/UGIM.2003.1225714