• DocumentCode
    1962173
  • Title

    Creating high-stability high-precision bipolar trim power supply

  • Author

    Chen, Zhe ; Merz, W.

  • Author_Institution
    Thomas Jefferson Nat. Accel. Facility, Newport News, VA, USA
  • fYear
    2012
  • fDate
    9-13 July 2012
  • Firstpage
    1
  • Lastpage
    5
  • Abstract
    Thomas Jefferson National Accelerator Facility (TJNAF) is founded by the US Department of Energy (DOE) office of science for the technology advancement and physics research in electron beam accelerator. This facility has the state of the art technology to carry out world-class cutting-edge experiments for the nucleus composition and atomic characteristics identification and exploration for the nature of the matter in the universe. A continuous wave electron beam is featured for such experiments, thus precise and stable trim power supply is required to meet such purpose. This paper demonstrates the challenges and solutions to design, assemble, fabrication and test such high-precision high-stability power supplies. This paper presents the novel design and first article test of the ±20A ±75V bipolar, 100ppm stability level current-regulated high-power trim power supplies for the beam manipulation. This special design can provide valuable documentation and reference values for future designs and special applications in particle accelerator power supply creation.
  • Keywords
    electron accelerators; power supplies to apparatus; Thomas Jefferson National Accelerator Facility; atomic characteristics identification; beam manipulation; current 20 A; current regulated high power trim power supplies; electron beam accelerator; high-precision bipolar trim power supply; high-stability bipolar trim power supply; nucleus composition; particle accelerator power supply; voltage 75 V; feedback control; integrated circuit; temperature test; trim power supply;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Power Engineering Society Conference and Exposition in Africa (PowerAfrica), 2012 IEEE
  • Conference_Location
    Johannesburg
  • Print_ISBN
    978-1-4673-2548-6
  • Type

    conf

  • DOI
    10.1109/PowerAfrica.2012.6498637
  • Filename
    6498637