Title :
Integration of BaTiO3ferroelectric thin films with GaAs for functional devices
Author :
Murphy, Timothy E. ; Chen, Ding-Yuan ; Phillips, Jamie D.
Author_Institution :
Dept. of Electr. Eng. & Comput. Sci., Michigan Univ., Ann Arbor, MI, USA
fDate :
30 June-2 July 2003
Abstract :
The integration of ferroelectric oxides with GaAs could enable monolithic optoelectronic integrated circuits, advanced metal-insulator-semiconductor structures, and multifunctional optoelectronic devices. BaTiO3 is a good candidate for this integration due to the large spontaneous polarization and large electro-optic effects, but presents a challenge due to the large lattice mismatch and difficulty in achieving a crystalline oxide interface on GaAs. In this paper we investigate the deposition of BaTiO3 onto GaAs by pulsed laser deposition using varied substrate preparation techniques and MgO buffer layers. Highly oriented [001] BaTiO3 thin films are achieved exhibiting spontaneous polarization characteristic of ferroelectric material.
Keywords :
III-V semiconductors; barium compounds; dielectric polarisation; ferroelectric materials; ferroelectric thin films; gallium arsenide; molecular beam epitaxial growth; pulsed laser deposition; semiconductor epitaxial layers; semiconductor growth; BaTiO3-GaAs; BaTiO3ferroelectric thin films; GaAs; MgO buffer layers; electrooptic effects; ferroelectric oxides; functional devices; lattice mismatch; metal-insulator-semiconductor structures; monolithic optoelectronic integrated circuits; multifunctional optoelectronic devices; polarization; pulsed laser deposition; substrate preparation; Crystallization; Ferroelectric materials; Gallium arsenide; Lattices; Metal-insulator structures; Monolithic integrated circuits; Optical pulses; Optoelectronic devices; Polarization; Pulsed laser deposition;
Conference_Titel :
University/Government/Industry Microelectronics Symposium, 2003. Proceedings of the 15th Biennial
Print_ISBN :
0-7803-7972-1
DOI :
10.1109/UGIM.2003.1225740