The Study on 3D Electron Beam Lithography for Sub-micrometer Diffractive Optics

Author

Yin, Hung-Lin ; Hu, Joseph Y C ; Yu, Chih-Sheng

Author_Institution

Instrum. Technol. Res. Center, Hsinchu

fYear

2007

fDate

Aug. 12 2007-July 16 2007

Firstpage

149

Lastpage

150

Abstract

The fabrication technology of gray-scale electron beam lithography for hologram and Fresnel lens with sub-micrometer features has been reported in this paper. Mass-production of these optical elements by integrating with electroforming and hot embossing has also been demonstrated. For a more critical case, such as antireflective structure array, a novel scattering electron beam lithography has been successfully applied on this application.

Keywords

diffractive optical elements; electroforming; electron beam lithography; embossing; holographic optical elements; microlenses; optical fabrication; 3D electron beam lithography; Fresnel lens; antireflective structure array; electroforming integration; hologram lens; hot embossing; moth eye; optical elements; scattering electron beam lithography; submicrometer diffractive optics; Electron beams; Electron optics; Embossing; Gray-scale; Integrated optics; Lenses; Lithography; Optical device fabrication; Optical diffraction; Optical scattering; Fresnel lens; electron beam lithography; gray-scale; hologram; moth eye;

fLanguage

English

Publisher

ieee

Conference_Titel

Optical MEMS and Nanophotonics, 2007 IEEE/LEOS International Conference on

Conference_Location

Hualien

Print_ISBN

978-1-4244-0641-8

Type

conf

DOI

10.1109/OMEMS.2007.4373884

Filename

4373884