DocumentCode
1963203
Title
Tunable MEMS Actuated Microring Resonators
Author
Tien, Ming-Chun ; Mathai, Sagi ; Yao, Jin ; Wu, Ming C.
Author_Institution
Univ. of California, Oakland
fYear
2007
fDate
Aug. 12 2007-July 16 2007
Firstpage
177
Lastpage
178
Abstract
A simplified process has been developed to fabricate MEMS tunable microring resonators on six-inch silicon-on-insulator wafers. Deep UV lithography is used to create 220-nm-wide waveguides and microrings. The process is CMOS compatible. The transmission spectra change from a double resonance dip (under-coupling) to a broader single resonance dip (over-coupling) when the waveguide is moved closer to the microring. This is explained by coupled mode theory that includes the effect of backscattering in the microring.
Keywords
micro-optomechanical devices; micromechanical resonators; silicon-on-insulator; ultraviolet lithography; CMOS; Si; backscattering; deep UV lithography; double resonance dip; silicon-on-insulator wafers; size 220 nm; transmission spectra; tunable MEMS actuated microring resonators; Actuators; CMOS process; Coupling circuits; Lithography; Micromechanical devices; Optical resonators; Optical waveguides; Resonance; Silicon; Tunable circuits and devices; MEMS; doublet; optical filter; optical resonator;
fLanguage
English
Publisher
ieee
Conference_Titel
Optical MEMS and Nanophotonics, 2007 IEEE/LEOS International Conference on
Conference_Location
Hualien
Print_ISBN
978-1-4244-0641-8
Type
conf
DOI
10.1109/OMEMS.2007.4373898
Filename
4373898
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