Title :
Direct simulation of plasma-dust particle interactions with application to transport of dust particles in plasma processing discharges
Author :
Choi, Stanley Jungkyu ; Ventzek, P.L.G. ; Kushner, Mark J.
Author_Institution :
Dept. of Electr. & Comput. Eng., Illinois Univ., Urbana, IL, USA
Abstract :
Summary form only given. To investigate the forces on dust particles, a pseudoparticle-in-cell simulation has been developed. The results of the model provide the dust particle potential and shielding characteristics. Ion-dust particle and electron-dust particle momentum transfer cross sections are obtained by performing a molecular dynamics simulations. The transport of the dust particles in reactive ion etching (RIE) and inductively coupled plasma (ICP) reactors has been investigated using the ion-dust momentum transfer cross sections and ion fluxes obtained from a 2-dimensional plasma simulation. When the shielding length is commensurate with the size of the particle, the potential of the dust particle becomes more negative with increasing size (0.5-10 /spl mu/m). When particles are close to each other, their shielding volumes overlap, resulting in less momentum transfer between ions and dust particles.
Keywords :
plasma simulation; direct simulation; dust particle potential; dust particles; inductively coupled plasma reactors; ion fluxes; molecular dynamics simulations; particle momentum transfer cross sections; plasma processing discharges; plasma-dust particle interactions; pseudoparticle-in-cell simulation; reactive ion etching; shielding characteristics; transport; Atmospheric modeling; Clouds; Dusty plasma; Magnetic field measurement; Plasma applications; Plasma chemistry; Plasma materials processing; Plasma measurements; Plasma simulation; Plasma transport processes;
Conference_Titel :
Plasma Science, 1993. IEEE Conference Record - Abstracts., 1993 IEEE International Conference on
Conference_Location :
Vancouver, BC, Canada
Print_ISBN :
0-7803-1360-7
DOI :
10.1109/PLASMA.1993.593610