• DocumentCode
    1964635
  • Title

    Emissive species distributions in a DC arcjet plasma for diamond film synthesis

  • Author

    Yamaguchi, Hitoshi ; Ishii, M. ; Uematsu, Kazuki

  • fYear
    1993
  • fDate
    7-9 June 1993
  • Firstpage
    225
  • Abstract
    Summary form only given. An Ar-H/sub 2/-CH/sub 4/ arcjet plasma was experimentally analyzed to obtain 2-D images of emissive species. The distributions of such emissive species as H (656 nm, 486 nm), C/sub 2/ (516 nm), and CH (431 nm) were revealed to have a good correlation with the thickness and structure of diamond films. Though nonemissive radicals of CH/sub 3/ and ground state H atoms have been reported to play an important role in diamond growth, the images of the emissive radicals were found to be useful for the prediction of the diamond growth. The distribution of emissive radicals in a high-density plasma can be easily obtained compared with laser-induced fluorescence or IR absorption spectroscopy, which provides the nonemissive radical distribution following complicated experimental procedures.
  • Keywords
    diamond; 2-D images; 431 nm; 486 nm; 516 nm; 656 nm; Ar-H/sub 2/-methane; DC arcjet plasma; IR absorption spectroscopy; diamond film synthesis; diamond growth; emissive species distributions; film structure; film thickness; ground state H atoms; high-density plasma; laser-induced fluorescence; methyl radical; nonemissive radical distribution; nonemissive radicals; Argon; Atomic layer deposition; Carbon dioxide; Diamond-like carbon; Electromagnetic wave absorption; Plasma chemistry; Plasma density; Silicon; Stationary state; Substrates;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science, 1993. IEEE Conference Record - Abstracts., 1993 IEEE International Conference on
  • Conference_Location
    Vancouver, BC, Canada
  • ISSN
    0730-9244
  • Print_ISBN
    0-7803-1360-7
  • Type

    conf

  • DOI
    10.1109/PLASMA.1993.593611
  • Filename
    593611