Title :
Emissive species distributions in a DC arcjet plasma for diamond film synthesis
Author :
Yamaguchi, Hitoshi ; Ishii, M. ; Uematsu, Kazuki
Abstract :
Summary form only given. An Ar-H/sub 2/-CH/sub 4/ arcjet plasma was experimentally analyzed to obtain 2-D images of emissive species. The distributions of such emissive species as H (656 nm, 486 nm), C/sub 2/ (516 nm), and CH (431 nm) were revealed to have a good correlation with the thickness and structure of diamond films. Though nonemissive radicals of CH/sub 3/ and ground state H atoms have been reported to play an important role in diamond growth, the images of the emissive radicals were found to be useful for the prediction of the diamond growth. The distribution of emissive radicals in a high-density plasma can be easily obtained compared with laser-induced fluorescence or IR absorption spectroscopy, which provides the nonemissive radical distribution following complicated experimental procedures.
Keywords :
diamond; 2-D images; 431 nm; 486 nm; 516 nm; 656 nm; Ar-H/sub 2/-methane; DC arcjet plasma; IR absorption spectroscopy; diamond film synthesis; diamond growth; emissive species distributions; film structure; film thickness; ground state H atoms; high-density plasma; laser-induced fluorescence; methyl radical; nonemissive radical distribution; nonemissive radicals; Argon; Atomic layer deposition; Carbon dioxide; Diamond-like carbon; Electromagnetic wave absorption; Plasma chemistry; Plasma density; Silicon; Stationary state; Substrates;
Conference_Titel :
Plasma Science, 1993. IEEE Conference Record - Abstracts., 1993 IEEE International Conference on
Conference_Location :
Vancouver, BC, Canada
Print_ISBN :
0-7803-1360-7
DOI :
10.1109/PLASMA.1993.593611