Title :
Design and technology interaction beyond 32nm
Author :
Clinton, Michael ; Bittlestone, Clive ; Girishankar, G. ; Le, Viet ; Menezes, Vinod
Author_Institution :
Texas Instrum., Dallas, TX, USA
Abstract :
This paper will discuss the challenges that continued technology scaling present to circuit designers and how the close interaction between the development of technology, design automation (EDA) tools and the circuit designer can overcome these challenges and enable designs that deliver the benefits customers expect from continued technology scaling.
Keywords :
semiconductor technology; (EDA) tools; circuit designers; continued technology scaling; design automation tools; size 32 nm; Delay; Layout; Random access memory; Resistance; System-on-a-chip; Transistors; Wires;
Conference_Titel :
Custom Integrated Circuits Conference (CICC), 2011 IEEE
Conference_Location :
San Jose, CA
Print_ISBN :
978-1-4577-0222-8
DOI :
10.1109/CICC.2011.6055353
