Title :
Hysteresis effect in pass-transistor based partially-depleted SOI CMOS circuits
Author :
Puri, R. ; Chuang, C.T.
Author_Institution :
IBM Thomas J. Watson Res. Center, Yorktown Heights, NY, USA
Abstract :
Summary form only given. Pass-transistor based circuits such as complementary pass-transistor logic (CPL) have recently emerged as strong contenders for implementation of high-performance arithmetic operations (Yano et al, 1996). The single-ended version known as LEAP offers the advantage of lower power in addition to high performance. The nMOS pass-transistor based circuits with partially-depleted SOI devices offer significant performance improvement over bulk-CMOS due to the absence of reverse body effects in the floating body configuration (thus minimising the V/sub T/ loss in passing the "high" state and improving the driving capability). This paper examines the effect of hysteretic V/sub T/ variation on the performance of LEAP and CPL circuits. The device used in this study has L/sub eff/=0.12 /spl mu/m, t/sub ox/=3.5 nm, t/sub Si/=200 nm, t/sub BOX/=400 nm, and the supply voltage (V/sub DD/) is 1.8 V.
Keywords :
CMOS logic circuits; buried layers; digital arithmetic; hysteresis; integrated circuit design; integrated circuit testing; logic design; silicon-on-insulator; 0.12 micron; 1.8 V; 200 nm; 3.5 nm; 400 nm; LEAP single-ended CPL circuit; Si thickness; Si-SiO/sub 2/; arithmetic operations; buried oxide thickness; complementary pass-transistor logic; floating body configuration; hysteresis effect; nMOS pass-transistor based circuits; oxide thickness; partially-depleted SOI devices; pass-transistor based circuits; pass-transistor based partially-depleted SOI CMOS circuits; reverse body effects; supply voltage; threshold voltage loss; Circuits; Delay effects; Frequency measurement; Pulse measurements; Space vector pulse width modulation; Threshold voltage; Time measurement;
Conference_Titel :
SOI Conference, 1998. Proceedings., 1998 IEEE International
Conference_Location :
Stuart, FL, USA
Print_ISBN :
0-7803-4500-2
DOI :
10.1109/SOI.1998.723132