Title :
Temperature Dependent Thermal Resistances at GaN-Substrate Interfaces in GaN Composite Substrates
Author :
Cho, Jungwan ; Li, Yiyang ; Altman, David H. ; Hoke, William E. ; Asheghi, Mehdi ; Goodson, Kenneth E.
Author_Institution :
Dept. of Mech. Eng., Stanford Univ., Stanford, CA, USA
Abstract :
We report the temperature dependent thermal properties of two types of GaN composite substrates (GaN-SiC and GaN-Si) using picosecond time-domain thermoreflectance (TDTR). The intrinsic thermal conductivity of the GaN buffer film decreases with increasing temperature, while the GaN-substrate thermal interface resistance (TIR) increases with increasing temperature. The strong temperature dependence of the GaN-substrate TIR suggests that microstructural defects within the AlN transition film and near its boundaries can be particularly important.
Keywords :
gallium compounds; high electron mobility transistors; silicon; silicon compounds; substrates; thermal conductivity; thermal resistance; thermoreflectance; time-domain analysis; HEMT device operation; TDTR; aluminium nitride transition film; gallium nitride buffer film; gallium nitride composite substrates; gallium nitride substrate TIR; gallium nitride substrate thermal interface resistance; intrinsic thermal conductivity; microstructural defects; picosecond time-domain thermoreflectance; temperature-dependent thermal properties; temperature-dependent thermal resistances; Conductivity; Gallium nitride; Substrates; Temperature dependence; Temperature measurement; Thermal conductivity; Thermal resistance;
Conference_Titel :
Compound Semiconductor Integrated Circuit Symposium (CSICS), 2012 IEEE
Conference_Location :
La Jolla, CA
Print_ISBN :
978-1-4673-0928-8
DOI :
10.1109/CSICS.2012.6340094