DocumentCode :
1966185
Title :
Phase-state low electron-number drive random access memory (PLEDM)
Author :
Nakazato, K. ; Itoh, K. ; Ahmed, H. ; Mizuta, H. ; Kisu, T. ; Kato, M. ; Sakata, T.
Author_Institution :
Hitachi Eur. Ltd., Cambridge, UK
fYear :
2000
fDate :
9-9 Feb. 2000
Firstpage :
132
Lastpage :
133
Abstract :
Dynamic random access memories (DRAMs) based on a transistor/capacitor cell are used as main memories in computers because of their high capacity and high speed. Since there is no gain in the present DRAM cell, it requires a large cell-capacitor to produce an adequate sense signal. In each new memory generation, structure and fabrication have become more complicated to maintain a large capacitor while miniaturizing the cell. This phase-state low electron-number drive memory (PLEDM) gain cell uses a stacked tunnel transistor (PLEDTR). Since this cell has gain, a large capacitor is not necessary. The cell size is 5F/sup 2/ where F is the minimum feature size. Its read and write times are simulated as 20ns and 5ns, respectively. In principle, it is possible with PLEDM to have a retention time longer than 10 years, enabling a nonvolatile memory to be realised.
Keywords :
MOS memory circuits; random-access storage; tunnel transistors; 20 ns; 5 ns; cell size; gain cell; nonvolatile memory; phase-state low electron-number drive memory; read times; retention time; stacked tunnel transistor; write times; Capacitors; Electrons; Europe; Leakage current; MOSFET circuits; Random access memory; Semiconductor impurities; Silicon compounds; Threshold voltage; Ultra large scale integration;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid-State Circuits Conference, 2000. Digest of Technical Papers. ISSCC. 2000 IEEE International
Conference_Location :
San Francisco, CA, USA
ISSN :
0193-6530
Print_ISBN :
0-7803-5853-8
Type :
conf
DOI :
10.1109/ISSCC.2000.839719
Filename :
839719
Link To Document :
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