• DocumentCode
    1967350
  • Title

    A 0.4 /spl mu/m 3.3 V 1T1C 4 Mb nonvolatile ferroelectric RAM with fixed bit-line reference voltage scheme and data protection circuit

  • Author

    Byung-Gil Jeon ; Mun-Kyu Choi ; Yoonjong Song ; Seung-Kyu Oh ; Yeonbae Chung ; Kang-Deog Suh ; Kinam Kim

  • Author_Institution
    Samsung Electron. Co. Ltd., Kyunggi, South Korea
  • fYear
    2000
  • fDate
    9-9 Feb. 2000
  • Firstpage
    272
  • Lastpage
    273
  • Abstract
    The charge distribution of memory cells is an important issue in high-density ferroelectric RAM (FRAM). Using memory cells as the reference cells provides an optimum reference voltage level, which automatically tracks the main memory cell properties. However, when memory cells are used as reference cells, the reference cells experience more access cycling than normal cells. Therefore, the endurance of the FRAM devices is determined by reference cells rather than by normal cells. Another issue is that, when the memory cells are used as reference cells, reference voltage level fluctuation cannot be avoided, especially in high-density FRAM, because variations of PZT film grain size and dimensions of the capacitor become serious. A variable reference bit line voltage scheme overcomes these problems. Unfortunately, the reference bit-line voltage scheme is not useful for all memory cells, because the reference voltage level is determined by a limited number of cells, not by all memory cells. This bit-line reference scheme is optimized with all of the memory cell charge information. Data protection is also used for unintentional power-off. An optimum read pulse width is suggested for high-speed FRAM.
  • Keywords
    ferroelectric storage; integrated memory circuits; protection; random-access storage; reference circuits; 3.3 V; 4 Mbit; FRAM devices; PZT; PZT film grain size; PbZrO3TiO3; capacitor dimensions; charge distribution; data protection circuit; fixed bit-line reference voltage scheme; high-density FRAM; high-speed FRAM; memory cell charge information; memory cell properties; memory cells; nonvolatile ferroelectric RAM; optimum read pulse width; optimum reference voltage level; Capacitors; Circuits; Ferroelectric films; Nonvolatile memory; Protection; Pulse measurements; Random access memory; Space vector pulse width modulation; Timing; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid-State Circuits Conference, 2000. Digest of Technical Papers. ISSCC. 2000 IEEE International
  • Conference_Location
    San Francisco, CA, USA
  • ISSN
    0193-6530
  • Print_ISBN
    0-7803-5853-8
  • Type

    conf

  • DOI
    10.1109/ISSCC.2000.839781
  • Filename
    839781