DocumentCode
1968505
Title
Novel periodic microstructures fabricated by multi-exposure two-beam interference lithography
Author
Bai, Yinbing ; Zhang, A. Ping
Author_Institution
State Key Lab. of Modern Opt. Instrum., Zhejiang Univ., Hangzhou, China
fYear
2010
fDate
8-12 Dec. 2010
Firstpage
469
Lastpage
470
Abstract
Some novel periodic structures with different internal nanopatterns are numerically and experimentally demonstrated based on multi-exposure two-beam interference lithography. Two-dimensional quasi-crystal structures were fabricated with precisely controlled exposure directions and doses. The experiment results show such a fabrication technology is very promising for making diverse large-area submicron structures.
Keywords
lithography; nanopatterning; 2D quasi-crystal structures; fabrication technology; internal nanopatterns; large-area submicron structures; multiexposure two-beam interference lithography; periodic microstructures; periodic structures; precisely controlled exposure directions; Interference; Laser beams; Lithography; Optical device fabrication; Optical polarization; Periodic structures;
fLanguage
English
Publisher
ieee
Conference_Titel
Communications and Photonics Conference and Exhibition (ACP), 2010 Asia
Conference_Location
Shanghai
Print_ISBN
978-1-4244-7111-9
Type
conf
DOI
10.1109/ACP.2010.5682582
Filename
5682582
Link To Document