Title :
Fabrication of 2-D photonic crystals by deep etching
Author :
Chelnokov, Alexei
Author_Institution :
Corning S.A., Avon, France
Abstract :
Summary form only given. The use of deep etch is necessary to build efficient near-infrared 2D photonic crystals and is still limiting part of their fabrication. Recent theoretical studies have once again underlined the need for deeper etch during 2D photonic crystal fabrication (Benisty et al, 2000). The scope of this presentation is limited to the near-IR photonic crystals fabricated in silicon. The silicon microstructuring technology benefits from the long history of microelectronics and is still in advance on that of III-Vs
Keywords :
crystal microstructure; elemental semiconductors; etching; optical fabrication; optical materials; photonic band gap; silicon; 2D photonic crystals fabrication; Si; deep etching; microelectronics; near-IR photonic crystals; near-infrared 2D photonic crystals; photonic crystals fabrication; silicon; silicon microstructuring technology; Anisotropic magnetoresistance; Etching; Fabrication; Optical modulation; Photonic crystals; Plasma applications; Plasma chemistry; Plasma materials processing; Plasma temperature; Silicon;
Conference_Titel :
Lasers and Electro-Optics Society, 2001. LEOS 2001. The 14th Annual Meeting of the IEEE
Conference_Location :
San Diego, CA
Print_ISBN :
0-7803-7105-4
DOI :
10.1109/LEOS.2001.969213
