Title :
A Manufacturable Sub-50nm PMOSFET Technology
Author :
Loo, J.J.G.P. ; Ponomarev, Y.V. ; Kaiser, M. ; Verheijen, M.A. ; Cubaynes, F.N. ; Dachs, C.J.J.
Author_Institution :
Philips Research Leuven, Belgium
fDate :
11-13 September 2001
Keywords :
Annealing; Etching; Implants; Leakage current; Lithography; MOSFET circuits; Manufacturing; Resists; Silicon; Space technology;
Conference_Titel :
Solid-State Device Research Conference, 2001. Proceeding of the 31st European
Print_ISBN :
2-914601-01-8
DOI :
10.1109/ESSDERC.2001.195222
