Title :
Carbon Implanted Halo for Super Halo Characteristic NFETs in Bulk and SOI
Author :
Ellis-Monaghan, John ; Lee, Kam-Leung ; Ieong, Meikei ; Yang, Isabel
Author_Institution :
IBM Microelectronics, Essex Junction, USA
fDate :
11-13 September 2001
Keywords :
Annealing; Boron; Implants; Subthreshold current; Temperature; Threshold voltage;
Conference_Titel :
Solid-State Device Research Conference, 2001. Proceeding of the 31st European
Print_ISBN :
2-914601-01-8
DOI :
10.1109/ESSDERC.2001.195224
