DocumentCode :
1970650
Title :
Enhanced Velocity Overshoot and Transconductance in Si/Si(0.64)Ge(0.36)/Si pMOSFETs - Predictions for Deep Submicron Devices
Author :
Palmer, M.J. ; Braithwaite, G. ; Prest, M.J. ; Parker, E.H.C. ; Whall, T.E. ; Zhao, Y.P. ; Kaya, S. ; Watling, J.R. ; Asenov, A. ; Barker, J.R. ; Waite, A.M. ; Evans, A.G.R.
Author_Institution :
University of Warwick, Coventry, UK
fYear :
2001
fDate :
11-13 September 2001
Firstpage :
199
Lastpage :
202
Keywords :
Electric variables measurement; Electron mobility; Fabrication; Germanium silicon alloys; Length measurement; MOS devices; MOSFETs; Silicon germanium; Thickness measurement; Transconductance;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid-State Device Research Conference, 2001. Proceeding of the 31st European
Print_ISBN :
2-914601-01-8
Type :
conf
DOI :
10.1109/ESSDERC.2001.195235
Filename :
1506617
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=1970650