Title :
Experimental and Numerical Study of Shallow Trench Isolation Processes
Author :
Erlebach, A. ; Yun, C.S. ; Matveev, D. ; Mickevicius, R. ; Nouri, F. ; Golnas, A. ; Zelenka, S. ; Fichtner, W.
Author_Institution :
Integrated Systems Engineering, Zurich, Switzerland
fDate :
11-13 September 2001
Keywords :
CMOS technology; Isolation technology; Laboratories; MOSFETs; Modeling; Oxidation; Shape; Stress; Systems engineering and theory; Temperature;
Conference_Titel :
Solid-State Device Research Conference, 2001. Proceeding of the 31st European
Print_ISBN :
2-914601-01-8
DOI :
10.1109/ESSDERC.2001.195241
