Title :
A soft error immune 0.35 /spl mu/m PD-SOI SRAM technology compatible with bulk CMOS
Author :
Ikeda, T. ; Wakahara, S. ; Tamaki, Y. ; Higuchi, H.
Author_Institution :
Device Dev. Center, Hitachi Ltd, Tokyo, Japan
Abstract :
It has been noted that the soft error rate of the partially depleted SOI (PD-SOI) SRAM is not improved as compared with bulk CMOS SRAMs due to floating body effects through simulation (Tosaka et al. 1995). There has been no soft error data reported in the papers on SOI SRAMs, except for those used for space applications. In high-density PD-SOI SRAMs, a body contact is essential to reduce soft error rates. It has been proposed that a thin well layer left between the isolation and the buried oxide can provide a convenient body contact layer that has no area penalty and is compatible with bulk CMOS (Chen et al. 1996). However, soft error data and the required body contact resistance needed to suppress the floating body effect has not been clear. Thus, we have fabricated 288-kbit SRAM test chips with 0.35 /spl mu/m CMOS technology and confirmed that the soft error rate can be improved. We also estimated the body contact resistance required for soft error improvement through device simulation.
Keywords :
CMOS memory circuits; SRAM chips; circuit simulation; integrated circuit modelling; integrated circuit reliability; integrated circuit testing; radiation hardening (electronics); silicon-on-insulator; 0.35 micron; 288 kbit; CMOS technology; PD-SOI SRAM; SOI SRAMs; SRAM test chips; Si-SiO/sub 2/; body contact; body contact layer; body contact resistance; bulk CMOS SRAMs; bulk CMOS compatibility; buried oxide; device simulation; floating body effect suppression; floating body effects; high-density PD-SOI SRAMs; isolation; partially depleted SOI SRAM; simulation; soft error data; soft error immune PD-SOI SRAM technology; soft error rate; thin well layer; CMOS technology; Error analysis; Immune system; Random access memory; Resists; Voltage;
Conference_Titel :
SOI Conference, 1998. Proceedings., 1998 IEEE International
Conference_Location :
Stuart, FL, USA
Print_ISBN :
0-7803-4500-2
DOI :
10.1109/SOI.1998.723160