Title :
Impact of Channel Engineering Technology on HC Performance of 100 nm MOSFETs
Author :
Okhonin, S. ; Fazan, P. ; Kubicek, S. ; Henson, K. ; De Meyer, K. ; Ponomarev, Y.V.
Author_Institution :
Swiss Federal Institute of Technology, Lausanne, Switzerland
fDate :
11-13 September 2001
Conference_Titel :
Solid-State Device Research Conference, 2001. Proceeding of the 31st European
Print_ISBN :
2-914601-01-8
DOI :
10.1109/ESSDERC.2001.195256
