Impact of Channel Engineering Technology on HC Performance of 100 nm MOSFETs

Author

Okhonin, S. ; Fazan, P. ; Kubicek, S. ; Henson, K. ; De Meyer, K. ; Ponomarev, Y.V.

Author_Institution

Swiss Federal Institute of Technology, Lausanne, Switzerland

fYear

2001

fDate

11-13 September 2001

Firstpage

283

Lastpage

286

Keywords

MOSFETs;

fLanguage

English

Publisher

ieee

Conference_Titel

Solid-State Device Research Conference, 2001. Proceeding of the 31st European

Print_ISBN

2-914601-01-8

Type

DOI

10.1109/ESSDERC.2001.195256

Filename

1506638

Link To Document