DocumentCode
1971292
Title
Realization of transparency in ZnO/ZnO/Ag thin films for electrode
Author
Saiga, N. ; Yamamichi, K. ; Atarashi, Y.
Author_Institution
Electron. Control Eng., Yonago Nat. Coll. of Technol., Yonago, Japan
fYear
2009
fDate
30-3 Aug. 2009
Firstpage
1
Lastpage
2
Abstract
ZnO/ZnO/Ag thin films comprising a Zn-rich ZnO layer was investigated. The optical transparency was changed in each stage of ZnO depositions according to the variation of complex refractive index in the Ag film.
Keywords
II-VI semiconductors; electrodes; metallic thin films; optical films; refractive index; semiconductor thin films; semiconductor-metal boundaries; silver; sputtered coatings; transparency; wide band gap semiconductors; zinc compounds; ZnO depositions; ZnO-ZnO-Ag; complex refractive index; electrode; optical transparency; sputtering; thin films; Electrodes; Frequency; Optical films; Optical refraction; Optical variables control; Oxidation; Refractive index; Sputtering; Transistors; Zinc oxide; Ag; ZnO; plasma frequency; transparency;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers & Electro Optics & The Pacific Rim Conference on Lasers and Electro-Optics, 2009. CLEO/PACIFIC RIM '09. Conference on
Conference_Location
Shanghai
Print_ISBN
978-1-4244-3829-7
Electronic_ISBN
978-1-4244-3830-3
Type
conf
DOI
10.1109/CLEOPR.2009.5292190
Filename
5292190
Link To Document