Title :
Impact of Shallow Trench Liner Oxidation Scheme on Junction Leakage
Author :
Gopinath, V.P. ; Puchner, H. ; Mirabedini, M.
Author_Institution :
LSI Logic Corporation, Santa Clara, USA
fDate :
11-13 September 2001
Keywords :
Area measurement; Diodes; Etching; Large scale integration; Leakage current; Logic; Oxidation; Silicidation; Stress; Temperature measurement;
Conference_Titel :
Solid-State Device Research Conference, 2001. Proceeding of the 31st European
Print_ISBN :
2-914601-01-8
DOI :
10.1109/ESSDERC.2001.195290
