Title :
Sacrificial spacer technology for suppressed reverse narrow channel effects with shallow trench isolation
Author :
Lunenborg, M. ; De Coster, W. ; Guelen, J. ; Inard, A.
Author_Institution :
Philips Semiconductors, Crolles, France
fDate :
11-13 September 2001
Keywords :
Atomic force microscopy; CMOS technology; Etching; Fabrication; Implants; Isolation technology; MOS devices; Scanning electron microscopy; Space technology; Threshold voltage;
Conference_Titel :
Solid-State Device Research Conference, 2001. Proceeding of the 31st European
Print_ISBN :
2-914601-01-8
DOI :
10.1109/ESSDERC.2001.195291
