DocumentCode :
1972111
Title :
Degradation and reliability of silicon power transistors
Author :
Schmitz, Jurriaan
Author_Institution :
University of Twente Drienerlolaan 5, Enschede, 7522 NB Netherlands
fYear :
2013
fDate :
13-17 Oct. 2013
Firstpage :
19
Lastpage :
19
Abstract :
The degradation of silcon power transistors (RESURF LDMOS type) are studied under high voltage off-state and on-state stress conditions. The deterioration of the devices is shown to be hot-carrier dominated. Hot carrier damage occurs at the drain side of the drift region and leads to changing I-Vcurves in two distinct regimes. With a non-invasive low-voltage leakage characterization the surface generation velocity profiles after stress can be extracted. These enable predictions of the I-V behaviour across a wide temperature range, and may be used for reliability projections of these devices.
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Integrated Reliability Workshop Final Report (IRW), 2013 IEEE International
Conference_Location :
South Lake Tahoe, CA, USA
ISSN :
1930-8841
Print_ISBN :
978-1-4799-0350-4
Type :
conf
DOI :
10.1109/IIRW.2013.6804144
Filename :
6804144
Link To Document :
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