Title : 
Degradation and reliability of silicon power transistors
         
        
            Author : 
Schmitz, Jurriaan
         
        
            Author_Institution : 
University of Twente Drienerlolaan 5, Enschede, 7522 NB Netherlands
         
        
        
        
        
        
            Abstract : 
The degradation of silcon power transistors (RESURF LDMOS type) are studied under high voltage off-state and on-state stress conditions. The deterioration of the devices is shown to be hot-carrier dominated. Hot carrier damage occurs at the drain side of the drift region and leads to changing I-Vcurves in two distinct regimes. With a non-invasive low-voltage leakage characterization the surface generation velocity profiles after stress can be extracted. These enable predictions of the I-V behaviour across a wide temperature range, and may be used for reliability projections of these devices.
         
        
        
        
            Conference_Titel : 
Integrated Reliability Workshop Final Report (IRW), 2013 IEEE International
         
        
            Conference_Location : 
South Lake Tahoe, CA, USA
         
        
        
            Print_ISBN : 
978-1-4799-0350-4
         
        
        
            DOI : 
10.1109/IIRW.2013.6804144