Title :
Diagnostics of ablation dynamics of tin micro-droplet for EUV lithography light source
Author :
Nakamura, D. ; Okazaki, K. ; Akiyama, T. ; Toya, K. ; Takahashi, A. ; Okada, T. ; Yanagida, T. ; Ueno, Y. ; Sasaki, Y. ; Suganuma, T. ; Nakano, M. ; Komori, H. ; Sumitani, A. ; Endo, A.
Author_Institution :
Grad. Sch. of Inf. Sci. & Electr. Eng., Kyushu Univ., Fukuoka, Japan
Abstract :
The ablation dynamics of tin micro-droplet target irradiated by double pulses was investigated for extreme ultraviolet lithography source. Debris from Sn droplet target was visualized by the laser-induced fluorescence imaging and shadowgraph imaging.
Keywords :
drops; fluorescence; laser ablation; light sources; ultraviolet lithography; EUV lithography light source; Sn; ablation dynamics; double pulses; laser induced fluorescence imaging; shadowgraph imaging; tin microdroplet; High speed optical techniques; Laser ablation; Laser theory; Light sources; Lithography; Optical imaging; Optical pumping; Plasma sources; Tin; Ultraviolet sources; EUV; Laser-produced plasma; debris; droplet;
Conference_Titel :
Lasers & Electro Optics & The Pacific Rim Conference on Lasers and Electro-Optics, 2009. CLEO/PACIFIC RIM '09. Conference on
Conference_Location :
Shanghai
Print_ISBN :
978-1-4244-3829-7
Electronic_ISBN :
978-1-4244-3830-3
DOI :
10.1109/CLEOPR.2009.5292242
