DocumentCode
1972582
Title
(Late) Reliability and performance considerations for NMOSFET pass gates in FPGA applications
Author
Kaczer, Ben ; Chen, Christopher S. ; Watt, J.T. ; Chanda, Kaushik ; Weckx, Pieter ; Luque, M.T. ; Groeseneken, Guido ; Grasser, Tibor
Author_Institution
Imec Kapeldreef 75, Leuven, Belgium
fYear
2013
fDate
13-17 Oct. 2013
Firstpage
94
Lastpage
97
Abstract
The NMOSFET-only pass gates used in some digital CMOS applications, such as the Field-Programmable Gate Arrays (FPGAs), are apparently vulnerable to Positive Bias Temperature Instability (PBTI). Here we discuss the impact of PBTI frequency and workload on high-k/metal-gate NMOSFETs in terms of Capture-and-Emission Time (CET) maps and quantitatively explain the degradation of our test circuit. From individual trapping events in deeply-scaled NMOSFETs we then project PBTI distributions at 10 years. Finally, we show that at increased supply voltage the pass gate speed degradation is outweighed by signal transfer speedup, resulting in a net performance improvement.
Keywords
CMOS digital integrated circuits; MOSFET; field programmable gate arrays; semiconductor device reliability; FPGA applications; NMOSFET pass gates; PBTI frequency; capture-emission time maps; digital CMOS applications; field-programmable gate arrays; high-k-metal-gate NMOSFETs; positive bias temperature instability; reliability; trapping events; Degradation; Delays; Integrated circuit reliability; Logic gates; MOSFET circuits; Stress; PBTI; pass gate; performance; reliability;
fLanguage
English
Publisher
ieee
Conference_Titel
Integrated Reliability Workshop Final Report (IRW), 2013 IEEE International
Conference_Location
South Lake Tahoe, CA
ISSN
1930-8841
Print_ISBN
978-1-4799-0350-4
Type
conf
DOI
10.1109/IIRW.2013.6804167
Filename
6804167
Link To Document