• DocumentCode
    1972582
  • Title

    (Late) Reliability and performance considerations for NMOSFET pass gates in FPGA applications

  • Author

    Kaczer, Ben ; Chen, Christopher S. ; Watt, J.T. ; Chanda, Kaushik ; Weckx, Pieter ; Luque, M.T. ; Groeseneken, Guido ; Grasser, Tibor

  • Author_Institution
    Imec Kapeldreef 75, Leuven, Belgium
  • fYear
    2013
  • fDate
    13-17 Oct. 2013
  • Firstpage
    94
  • Lastpage
    97
  • Abstract
    The NMOSFET-only pass gates used in some digital CMOS applications, such as the Field-Programmable Gate Arrays (FPGAs), are apparently vulnerable to Positive Bias Temperature Instability (PBTI). Here we discuss the impact of PBTI frequency and workload on high-k/metal-gate NMOSFETs in terms of Capture-and-Emission Time (CET) maps and quantitatively explain the degradation of our test circuit. From individual trapping events in deeply-scaled NMOSFETs we then project PBTI distributions at 10 years. Finally, we show that at increased supply voltage the pass gate speed degradation is outweighed by signal transfer speedup, resulting in a net performance improvement.
  • Keywords
    CMOS digital integrated circuits; MOSFET; field programmable gate arrays; semiconductor device reliability; FPGA applications; NMOSFET pass gates; PBTI frequency; capture-emission time maps; digital CMOS applications; field-programmable gate arrays; high-k-metal-gate NMOSFETs; positive bias temperature instability; reliability; trapping events; Degradation; Delays; Integrated circuit reliability; Logic gates; MOSFET circuits; Stress; PBTI; pass gate; performance; reliability;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Integrated Reliability Workshop Final Report (IRW), 2013 IEEE International
  • Conference_Location
    South Lake Tahoe, CA
  • ISSN
    1930-8841
  • Print_ISBN
    978-1-4799-0350-4
  • Type

    conf

  • DOI
    10.1109/IIRW.2013.6804167
  • Filename
    6804167