DocumentCode :
1973486
Title :
An Approach for Versatile Highly-Uniform Movpe Growth - the Flow Controlled Stagnation Point Flow Reactor
Author :
Kondo, Makoto ; Kuramata, Akito ; Fujii, Takuya ; Anayama, Chikashi ; Okazaki, Jiro ; Sekiguchi, Hiroshi ; Tanahashi, Toshiyuki ; Yamazaki, Susumu
Author_Institution :
Fujitsu Laboratories Ltd., Japan
fYear :
1992
fDate :
8-11 Jun 1992
Firstpage :
123
Lastpage :
124
Keywords :
Epitaxial growth; Epitaxial layers; Force control; Gallium arsenide; Hydrodynamics; Indium phosphide; Inductors; Laboratories; Large-scale systems; Temperature control;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Metalorganic Vapor Phase Epitaxy, 1992. Sixth International Conference
Print_ISBN :
0-87942-652-7
Type :
conf
DOI :
10.1109/MOVPE.1992.664973
Filename :
664973
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=1973486
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