• DocumentCode
    1973856
  • Title

    Aberration measurement of lithographic projection lens by using a translational symmetry Alt-PSM grating mark

  • Author

    Qiu, Zicheng ; Wang, Xiangzhao ; Bi, Qunyu ; Yuan, Qiongyan ; Peng, Bo ; Duan, Lifeng

  • Author_Institution
    Shanghai Inst. of Opt. & Fine Mech., Chinese Acad. of Sci., Shanghai, China
  • fYear
    2009
  • fDate
    30-3 Aug. 2009
  • Firstpage
    1
  • Lastpage
    2
  • Abstract
    A method to design a mark with high sensitivity is proved and declared. A translational symmetry Alt-PSM grating mark is redesigned with all of the even orders, plusmn3rd and plusmn5th orders diffraction light missing.
  • Keywords
    aberrations; diffraction gratings; lenses; photolithography; aberration measurement; diffraction gratings; lithographic projection lens; photolithography; translational symmetry Alt-PSM grating mark; Design methodology; Diffraction gratings; Interference; Lenses; Lighting; Lithography; Mechanical variables measurement; Optical imaging; Optical sensors; Vision defects; Diffraction gratings; Photolithography; aberration measurement;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Lasers & Electro Optics & The Pacific Rim Conference on Lasers and Electro-Optics, 2009. CLEO/PACIFIC RIM '09. Conference on
  • Conference_Location
    Shanghai
  • Print_ISBN
    978-1-4244-3829-7
  • Electronic_ISBN
    978-1-4244-3830-3
  • Type

    conf

  • DOI
    10.1109/CLEOPR.2009.5292307
  • Filename
    5292307
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1973856