DocumentCode

1974023

Title

The Elimination of H₂O and SiH₄ in AsH₃

Author

Ikeda, Takuya ; Noda, Hiroshi ; Matsumoto, Koh

Author_Institution

Fine-gas manufacturing Division, NIPPON SANSO Corp., Japan

fYear

1992

fDate

8-11 Jun 1992

Firstpage

128

Lastpage

129

Keywords

Aluminum; Ash; Epitaxial growth; Epitaxial layers; Gallium arsenide; Impurities; Laboratories; Purification; Surface cleaning; Surface treatment;

fLanguage

English

Publisher

ieee

Conference_Titel

Metalorganic Vapor Phase Epitaxy, 1992. Sixth International Conference

Print_ISBN

0-87942-652-7

Type

conf

DOI

10.1109/MOVPE.1992.664976

Filename

664976