• DocumentCode
    1975530
  • Title

    Influence of deposition temperature on the properties of Al2O3 thin films

  • Author

    Zhan, Meiqiong ; Wu, Luo ; Shao, Jianda

  • Author_Institution
    Shanghai Second Polytech. Univ., Shanghai, China
  • fYear
    2009
  • fDate
    30-3 Aug. 2009
  • Firstpage
    1
  • Lastpage
    2
  • Abstract
    Al2O3 thin films were characterized by optical and structural properties, as well as LIDT under 355 nm Nd:YAG laser. It was found that the deposition temperature had no clear effect on the LIDT in our experiments.
  • Keywords
    aluminium compounds; optical properties; solid lasers; Al2O3; LIDT; Nd:YAG laser; deposition temperature; optical properties; spectral properties; thin films; wavelength 355 nm; Aluminum oxide; Coatings; Dielectric thin films; Mechanical factors; Optical films; Optical filters; Plasma temperature; Solids; Sputtering; Substrates; Al2O3; deposition temperature; laser-induced damage threshold (LIDT);
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Lasers & Electro Optics & The Pacific Rim Conference on Lasers and Electro-Optics, 2009. CLEO/PACIFIC RIM '09. Conference on
  • Conference_Location
    Shanghai
  • Print_ISBN
    978-1-4244-3829-7
  • Electronic_ISBN
    978-1-4244-3830-3
  • Type

    conf

  • DOI
    10.1109/CLEOPR.2009.5292389
  • Filename
    5292389
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1975530