Title :
Minimal continuous thickness and microstructure of Mo thin films
Author :
Liang, Guangxing ; Fan, Ping ; Zhang, Dongping ; Cai, Xingmin ; Zheng, Zhuanghao ; Ru, Lili
Author_Institution :
Coll. of Phys. Sci. & Technol., Shenzhen Univ., Shenzhen, China
Abstract :
The minimal continuous thickness of Mo film was obtained. Microstructure analysis shows the characteristics peak increases sharply and RMS surface roughness reaches its maximum when thickness approaches the minimal continuous thickness. RMS then decreases rapidly.
Keywords :
crystal microstructure; metallic thin films; molybdenum; surface roughness; Mo; microstructure analysis; minimal continuous thickness; molybdenum thin film; surface roughness; Conductive films; Conductivity; Diffraction; Grain boundaries; Microstructure; Rough surfaces; Sputtering; Surface morphology; Surface roughness; Transistors; Ion-beam sputtering; Microstructure; Minimal continuous thickness; Mo thin films;
Conference_Titel :
Lasers & Electro Optics & The Pacific Rim Conference on Lasers and Electro-Optics, 2009. CLEO/PACIFIC RIM '09. Conference on
Conference_Location :
Shanghai
Print_ISBN :
978-1-4244-3829-7
Electronic_ISBN :
978-1-4244-3830-3
DOI :
10.1109/CLEOPR.2009.5292428
