DocumentCode
1976426
Title
Minimal continuous thickness and microstructure of Mo thin films
Author
Liang, Guangxing ; Fan, Ping ; Zhang, Dongping ; Cai, Xingmin ; Zheng, Zhuanghao ; Ru, Lili
Author_Institution
Coll. of Phys. Sci. & Technol., Shenzhen Univ., Shenzhen, China
fYear
2009
fDate
30-3 Aug. 2009
Firstpage
1
Lastpage
2
Abstract
The minimal continuous thickness of Mo film was obtained. Microstructure analysis shows the characteristics peak increases sharply and RMS surface roughness reaches its maximum when thickness approaches the minimal continuous thickness. RMS then decreases rapidly.
Keywords
crystal microstructure; metallic thin films; molybdenum; surface roughness; Mo; microstructure analysis; minimal continuous thickness; molybdenum thin film; surface roughness; Conductive films; Conductivity; Diffraction; Grain boundaries; Microstructure; Rough surfaces; Sputtering; Surface morphology; Surface roughness; Transistors; Ion-beam sputtering; Microstructure; Minimal continuous thickness; Mo thin films;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers & Electro Optics & The Pacific Rim Conference on Lasers and Electro-Optics, 2009. CLEO/PACIFIC RIM '09. Conference on
Conference_Location
Shanghai
Print_ISBN
978-1-4244-3829-7
Electronic_ISBN
978-1-4244-3830-3
Type
conf
DOI
10.1109/CLEOPR.2009.5292428
Filename
5292428
Link To Document