DocumentCode :
1976869
Title :
Electrothermal modeling of coaxial through silicon via (TSV) for three-dimensional ICs
Author :
Zhao, Wen-Sheng ; Wang, Xiao-Peng ; Xu, Xiao-Long ; Yin, Wen-Yan
Author_Institution :
Centre for Opt. & Electromagn. Res., Zhejiang Univ. Hangzhou, Hangzhou, China
fYear :
2010
fDate :
7-9 Dec. 2010
Firstpage :
1
Lastpage :
4
Abstract :
An equivalent lumped-element circuit model of coaxial TSV is proposed in this paper, in which both frequency- and temperature-dependent elements are extracted using the partial-element equivalent-circuit (PEEC) method. One important aspect of coaxial TSV modelling is its capacitance extraction, in which MOS effects are taken into account. The circuit model is also reduced to a transmission line one, with its transmission characteristics predicted theoretically for the silicon material but with different resistivities.
Keywords :
MOS capacitors; elemental semiconductors; equivalent circuits; integrated circuit packaging; silicon; transmission lines; MOS effects; Si; capacitance extraction; coaxial TSV modelling; coaxial through silicon via; electrical resistivity; electrothermal modeling; equivalent lumped-element circuit model; partial-element equivalent-circuit method; silicon material; three-dimensional IC; transmission line; Capacitance; Inductance; Integrated circuit modeling; Power transmission lines; Silicon; Threshold voltage; Through-silicon vias;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electrical Design of Advanced Packaging & Systems Symposium (EDAPS), 2010 IEEE
Conference_Location :
Singapore
ISSN :
2151-1225
Print_ISBN :
978-1-4244-9068-4
Electronic_ISBN :
2151-1225
Type :
conf
DOI :
10.1109/EDAPS.2010.5683012
Filename :
5683012
Link To Document :
بازگشت