Focused ion beam etched ring-resonator in CVD-grown Ge-Sb-S thin films

Author

Huang, C.-C. ; Ho, Y.-L.D. ; Knight, K. ; Rarity, J.G. ; Hewak, D.W.

Author_Institution

Optoelectron. Res. Centre, Univ. of Southampton, Southampton, UK

fYear

2009

fDate

30-3 Aug. 2009

Firstpage

1

Lastpage

2

Abstract

Focused ion beam technique has been applied to fabricate ring resonators in Ge-Sb-S thin films for optoelectronic applications. The CVD-grown Ge-Sb-S thin films have been characterizatezed by micro-Raman, scanning electron microscopy, energy dispersive X-ray analysis and UV-vis-NIR spectroscopy and the properties of the resonator are being assessed.

Keywords

CVD coatings; Raman spectra; X-ray chemical analysis; antimony compounds; chalcogenide glasses; focused ion beam technology; germanium compounds; optical fabrication; optical films; optical glass; optical resonators; scanning electron microscopy; semiconductor thin films; sputter etching; sulphur compounds; ultraviolet spectra; visible spectra; CVD thin films; Ge-Sb-S; Ge-Sb-S thin film; UV-vis-NIR spectroscopy; chalcogenide films; energy dispersive X-ray analysis; focused ion beam etching; germanium antimony sulphide glasses; microRaman spectroscopy; ring resonator fabrication; scanning electron microscopy; Amorphous materials; Dispersion; Etching; Glass; Ion beams; Optical films; Optical ring resonators; Scanning electron microscopy; Sputtering; Transistors; CVD; FIB ring-resonator; Ge-Sb-S; thin films;

fLanguage

English

Publisher

ieee

Conference_Titel

Lasers & Electro Optics & The Pacific Rim Conference on Lasers and Electro-Optics, 2009. CLEO/PACIFIC RIM '09. Conference on

Conference_Location

Shanghai

Print_ISBN

978-1-4244-3829-7

Electronic_ISBN

978-1-4244-3830-3

Type

conf

DOI

10.1109/CLEOPR.2009.5292465

Filename

5292465