• DocumentCode
    1978728
  • Title

    Intrinsic gate delay and energy-delay product in junctionless nanowire transistors

  • Author

    Razavi, Pedram ; Ferain, Isabelle ; Das, Samaresh ; Yu, Ran ; Akhavan, Nima Dehdashti ; Colinge, Jean-Pierre

  • Author_Institution
    Tyndall Nat. Inst., Univ. Coll. Cork, Cork, Ireland
  • fYear
    2012
  • fDate
    6-7 March 2012
  • Firstpage
    125
  • Lastpage
    128
  • Abstract
    In this paper we investigate two important device metrics, intrinsic gate-delay and energy-delay product of triple-gate junctionless nanowire transistors (JNTs) with gate lengths from 22 nm down to 15 nm, for different channel doping concentrations and compare them with those of triple-gate inversion-mode (EVI) nanowire field-effect transistors. Our study shows although intrinsic gate-delay is larger in junctionless devices compared to those of EVI devices, since the switching energy is smaller in JNTs, energy-delay product is almost identical for both junctionless and IM devices.
  • Keywords
    field effect transistors; nanowires; IM devices; JNT; channel doping concentrations; device metrics; energy-delay product; intrinsic gate delay; size 15 nm; size 22 nm; switching energy; triple-gate inversion-mode nanowire field-effect transistors; Delay; Doping; Logic gates; MOSFETs; Nanoscale devices; Semiconductor process modeling; Junctionless; Nanowire; energy-delay product; intrinsic delay; multigate transistors;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Ultimate Integration on Silicon (ULIS), 2012 13th International Conference on
  • Conference_Location
    Grenoble
  • Print_ISBN
    978-1-4673-0191-6
  • Electronic_ISBN
    978-1-4673-0190-9
  • Type

    conf

  • DOI
    10.1109/ULIS.2012.6193373
  • Filename
    6193373