Title :
Explicit model for tunneling and thermionic current in Schottky barrier Double-Gate MOSFETs
Author :
Schwarz, Mike ; Holtij, Thomas ; Kloes, Alexander ; Iñíguez, Benjamín
Author_Institution :
Competence Center for Nanotechnol. & Photonics, Tech. Hochschule Mittelhessen, Giessen, Germany
Abstract :
In this paper we present a new approach to calculate the tunneling and thermionic current in Schottky barrier Double-Gate MOSFETs (SB-DG-MOSFETs). This prediction is based on a physics-based two-dimensional analysis. Analytical approximations for the spatial tunneling current density and carrier distributions in the channel are introduced. From this explicit analytical model equations for the tunneling current are derived in closed-form which inherently include two-dimensional effects on the tunneling probability and the carrier distributions. Furthermore, an explicit analytical model equation for the thermionic current is derived. Comparison of the current with an already existing analytical numerical model and TCAD simulation data are in a good agreement for channel lengths down to 22nm.
Keywords :
MOSFET; current density; numerical analysis; tunnelling; SB-DG-MOSFET; Schottky barrier double-gate MOSFET; TCAD simulation data; analytical numerical model; carrier distributions; explicit analytical model equations; physics-based two-dimensional analysis; size 22 nm; spatial tunneling current density; thermionic current; tunneling current; tunneling probability; two-dimensional effects; Analytical models; Approximation methods; Current density; Equations; Logic gates; Mathematical model; Tunneling; 2D Poisson; Double-Gate (DG) MOSFET; Schottky barrier; closed-form equation; compact modeling; physics-based current model; thermionic current; tunneling current;
Conference_Titel :
Ultimate Integration on Silicon (ULIS), 2012 13th International Conference on
Conference_Location :
Grenoble
Print_ISBN :
978-1-4673-0191-6
Electronic_ISBN :
978-1-4673-0190-9
DOI :
10.1109/ULIS.2012.6193375